What This Document Is
This document contains a set of practice problems designed to reinforce your understanding of fundamental concepts in Microelectromechanical Systems (MEMS). Specifically, it’s a homework assignment for an introductory MEMS course (ELENG 247A) at the University of California, Berkeley. The questions require applying theoretical knowledge to practical scenarios encountered in MEMS fabrication and design. It’s geared towards solidifying your ability to analyze and predict outcomes in microfabrication processes.
Why This Document Matters
This assignment is invaluable for students actively learning about MEMS. Working through these problems will help you develop a deeper, more intuitive grasp of the material covered in lectures. It’s particularly useful for those preparing for exams or larger projects, as it provides an opportunity to test your problem-solving skills and identify areas where further study is needed. Successfully completing this assignment demonstrates a strong foundation in core MEMS principles.
Topics Covered
* Crystalline Plane Etching & Anisotropy
* Silicon Etching Processes (KOH, EDP)
* Lithography & Masking Techniques (Positive & Negative Resist)
* Thin Film Deposition (LPCVD Oxide, Polysilicon, PSG)
* Wet vs. Dry Etching Comparisons
* Process Flow Analysis & Cross-Sectional Visualization
* Thermal Oxidation & Annealing Processes
* Etch Rate Calculations & Selectivity
What This Document Provides
* A series of detailed process scenarios requiring cross-sectional diagrams.
* Problems focused on predicting the results of various etching and deposition steps.
* Opportunities to compare and contrast different fabrication techniques.
* Questions that require estimations of process times based on given parameters.
* Exercises designed to build proficiency in visualizing microfabrication processes.
