What This Document Is
This document represents lecture notes from EE 143: Microfabrication Technology at UC Berkeley, specifically focusing on the critical process of etching – part two of a series. It delves into the advanced techniques used to selectively remove materials in microfabrication, building upon foundational concepts. The material presented is geared towards students seeking a deeper understanding of the chemical and physical processes involved in creating microscale structures. It appears to be a continuation of a previous lecture (Etching I) and explores more complex etching methodologies.
Why This Document Matters
This resource is invaluable for students enrolled in microfabrication courses, or those studying related fields like materials science, electrical engineering, and nanotechnology. It’s particularly helpful when preparing for exams, completing assignments, or seeking to solidify understanding of core concepts *during* the course. Individuals working in research and development roles within the semiconductor industry or MEMS fabrication will also find the principles discussed highly relevant. Access to this material will enhance your comprehension of the practical challenges and solutions in microfabrication processes.
Topics Covered
* Advanced Etching Techniques – exploring methods beyond introductory approaches.
* Plasma Etching – examining the principles and applications of plasma-based etching.
* Reactive Ion Etching (RIE) – a detailed look at this widely used dry etching process.
* Selectivity in Etching – understanding how to control the removal of specific materials.
* Deep Reactive Ion Etching (DRIE) – investigating techniques for creating high-aspect-ratio structures.
* The role of reactive species generated within plasma environments.
* Factors influencing etching rates and process control.
What This Document Provides
* A focused exploration of etching methodologies used in microfabrication.
* Discussion of key parameters affecting etching performance.
* Contextual information relating to practical applications of etching techniques.
* A continuation of concepts introduced in a preceding lecture on etching fundamentals.
* Insights into the chemical and physical mechanisms driving the etching process.
* References to relevant terminology and concepts within the field of microfabrication.
