What This Document Is
This report details the operational procedures for a critical piece of equipment used in microfabrication: the Kasper Wafer Alignment System. It serves as a comprehensive guide for students learning to utilize this system for precise photolithography, a foundational technique in creating microscale structures. The document focuses on the practical aspects of operating the aligner, ensuring accurate mask alignment and UV exposure of semiconductor wafers. It’s designed to build competency in a core laboratory process within the course.
Why This Document Matters
This resource is essential for students enrolled in Microfabrication Technology (ELENG 143) at UC Berkeley who are preparing to work hands-on with the Kasper Aligner. It’s particularly valuable before and during lab sessions, providing a reference for understanding the system’s components and the correct sequence of operations. Mastering the information within will contribute to successful lab outcomes and a deeper understanding of photolithographic processes. It’s a key resource for anyone needing to confidently and safely operate this specific aligner model.
Topics Covered
* System overview and safety precautions
* Wafer and mask loading procedures
* Alignment system mechanics and controls
* Optical turret functionality and usage
* Vacuum system operation
* Illumination centering techniques
* Mask clamping and securing methods
* Stage control and adjustment ratios
What This Document Provides
* A detailed explanation of the Kasper Aligner’s integrated systems (optical, mechanical, pneumatic, and electrical).
* A step-by-step approach to preparing the aligner for operation.
* Guidance on utilizing both coarse and fine alignment techniques.
* Information on interpreting the various control settings and their impact on alignment precision.
* A structured framework for understanding the workflow of a typical photolithography process using this specific equipment.
